Kiʻi i hōʻike ʻia no ka papa polish wafer 99.7% Alumina

99.7% Alumina Wafer Polish Plate

Wehewehe Pōkole:

ʻO ka Chemshun 99.7%Al2O3 Alumina substrate ma ke ʻano he mea maʻemaʻe kiʻekiʻe a me ka nui o nā mea hou, loaʻa iā ia nā waiwai kino maikaʻi loa a me nā ʻano kemika paʻa, ke kumukūʻai maikaʻi e hoʻohālikelike ʻia me nā mea ʻē aʻe. Ke hoʻomau mau nei ka hoʻomohala ʻana o ka alumina maʻemaʻe kiʻekiʻe e nā noiʻi honua kiʻekiʻe a me nā keramika holomua a me nā hale hana keramika maikaʻi.

99.7% Alumina Wafer Polishing Plate no ka Chemical Mechanical Polish. Ma ke ʻano he ʻāpana koʻikoʻi o ke kaʻina hana polish kemika CMP. ʻO CMP ka mea e pono ai no ke kaʻina hana o ka sapphire a me ka Wafer o nā semiconductors.

ʻO nā papa hana poni a me ka lapping sapphire maʻemaʻe kiʻekiʻe o Chemshun Ceramics he 99.7% alumina ceramics, ua hoʻohālikelike ʻia ʻo Disc e like me ke kaʻina hana PIBM. He ʻenehana holomua kūloko ia. Ua hoʻoponopono maikaʻi ʻo PIBM i ka pilikia koʻikoʻi o ka māwae a me ka deformation o nā keramika alumina nui. E wehe ka ʻenehana PIBM i kahi puka makani ʻē aʻe o nā keramika maikaʻi.

E leka uila mai iā mākou

Nā kikoʻī huahana

Noi

E like me ka hoʻopili ʻana o ka wafer keramika Alumina a me nā diski lapping sapphire i hoʻohana ʻia i ka semi-conductive, daimana polishing etc.

Kaʻina Hana: ʻO nā ʻano hana Polishing a me ka lapping āpau, e like me ka polishing mechanical kemika CMP, Mechanical Polishing, Precision Polishing.

Hiʻona

Maʻemaʻe kiʻekiʻe a me ke kūpaʻa kemika
Ikaika Mechanical Kiʻekiʻe a me ka Paʻakikī
Ke kū'ē kiʻekiʻe i ka palaho
Ke kū'ē uila kiʻekiʻe
Kūpaʻa Mahana Kiʻekiʻe a hiki i 1700ºC
Hana Kū'ē Loa i ka Abrasion
Hana Hoʻokaʻawale Maikaʻi Loa
ʻO nā ʻano āpau o ka nui 180,360, 450, 600mm etc

Inoa huahana	99.7 kiʻekiʻe maʻemaʻe Alumina keramika Polishing Lapping Discs
Mea Hana	99.7% alumina
Ka nui maʻamau	D180, 360, 450, 600mm, ʻae ʻia ka nui i hoʻopilikino ʻia.
Waihoʻoluʻu	ʻAipoe
Noi	ʻO ke kaʻina hana Wafer a me Sapphire CMP ma ka ʻoihana semi-conductive
Kauoha liʻiliʻi loa	1Kiʻi

ʻIke Kemika / kino

		ʻĀpana	99.7 Nā keramika Alumina
Nā Waiwai Laulā	ʻO ka nui o Al2O3	wt%	99.7-99.9
	Ka nui o ka paʻa	gm/cc	3.94-3.97
	Waihoʻoluʻu	-	ʻAipoe
	Ka omo ʻana o ka wai	%	0
Nā Waiwai Mekanika	Ikaika Flexural (MOR) 20 ºC	Mpa(psix10^3)	440-550
	Modulus Elastic 20ºC	GPa (psix10^6)	375
	Paʻakikī Vickers	Gpa(kg/mm2) R45N	>=17
	Ikaika Kūlou	GPA	390
	Ikaika Hoʻopaʻa 25ºC	MPa(psix10^3)	248
	Paʻakikī o ka haki (KI c)	Mpa* m^1/2	4-5
Nā Waiwai Wela	Ka hoʻokele wela (20ºC)	W/mk	30
	Ka helu o ka hoʻonui ʻana o ka Thermal (25-1000ºC)	1x 10^-6/ºC	7.6
	Ke kū'ē ʻana i ka haʻalulu wela	ºC	200
	Mahana hoʻohana kiʻekiʻe loa	ºC	1700
Nā Pono Uila	Ikaika Dielectric (1MHz)	ac-kv/mm(ac v/mil)	8.7
	Paʻa Dielectric (1 MHz)	25ºC	9.7
	Ke kū'ē ʻana o ka leo	ohm-cm (25ºC)	>10^14
		ohm-cm (500ºC)	2×10^12
		ohm-cm (1000ºC)	2×10^7

lawelawe

Ke ʻae nei mākou i nā kauoha maʻamau.
Inā makemake ʻoe e ʻike i ka ʻike hou aku e pili ana i ka huahana, e ʻoluʻolu e hoʻokaʻaʻike mai iā mākou a e hāʻawi mākou iā ʻoe i ka huahana kūpono loa a me ka lawelawe maikaʻi loa!